OPTOELECTRONICS

Solutions for LED & high performance optoelectronics

 

From cost effective process and production solutions for deposition of TCOs, metals and different types of DBR solutions, to AlN buffer layer deposition with highly sophisticated process control, Evatec offers a broad range of standard and customized systems. Evatec addresses the requirements for downsized future LED dimensions including passivation / protection processes (SiOX based) by optimized film uniformities,

reduced particle levels and further improved process and tool stability for form factors up to 12 inch (e.g. with CLUSTERLINE® 300) and has been qualified by a number of fabs for the next generation micro LED / display technology.

THE EVATEC TOOL PORTFOLIO FOR
OPTOELECTRONICS

We offer evaporation, sputter and PECVD technologies on a range of batch, cluster or fully automated inline platforms.

Our experts are on hand to help you find the right platforms according to your process requirements, throughput and factory integration requirements. Alternatively, click on the photo links to read more about each platform. 

 

BAK FAMILY  

Industry standard evaporator platforms for metals deposition and "lift off" processes. "Autoload" option for fully automated cassette to cassette production on 6 or 8 inch.

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CLUSTERLINE® 200

An optoelectronics workhorse at leading LED and Micro LED Display manufacturers. Production proven for deposition processes including metals, TCOs and DBRs.

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CLUSTERLINE® 300 

Semiconductor industry standard cluster tool offering high uniformity deposition and etch capability on 300mm substrates and know-how for applications including OLED on CMOS.

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LLS EVO

Vertical batch sputter platform with long market pedigree the guaranteeing lowest cost of ownership especially for metal deposition.

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LED and Micro Display

Here is a taste of what Evatec can deliver 

Current Spreading, Reflectors and Metal Contacts

We deliver proven processes for the deposition of TCOs, dielectrics and metals, tailoring our process packages for maximum light extraction according to each individual customers LED package design. Choose  the BAK Evaporator with Autoload cassette-to-cassette handling for 6 and 8 inch. Alternatively the CLUSTERLINE® cluster platform equipped with batch process module technology offers plasma damage free low temperature sputter processing on GaN. To view the brochure click here. These same technologies also make "on chip" optical layer processing possible too.

AlN on Si or Sapphire

PVD growth of AlN buffer layers on Si or patterned Sapphire (PSS) on CLUSTERLINE® 200 enables subsequent defect free growth of GaN multi quantum wells (MQW) for manufacture of high brightness LEDs (HBLEDs) at reduced cost per lumen.

SiOx / SiN Passivation Layers and High Aspect Ratio

Addressing future needs for passivation of thin structures, Evatec offers PVD and PECVD based processes as well as solutions for high-aspect ratio coverage.

From cost effective process and production solutions for deposition of TCOs, metals and different types of DBR solutions, to AlN buffer layer deposition with highly sophisticated process control, Evatec offers a broad range of standard and customized systems. Evatec addresses the requirements for downsized future LED dimensions including passivation / protection processes (SiOX based) by optimized film uniformities,

reduced particle levels and further improved process and tool stability for form factors up to 12 inch (e.g. with CLUSTERLINE® 300) and has been qualified by a number of fabs for the next generation micro LED / display technology.

THE EVATEC TOOL PORTFOLIO FOR
OPTOELECTRONICS

We offer evaporation, sputter and PECVD technologies on a range of batch, cluster or fully automated inline platforms.

Our experts are on hand to help you find the right platforms according to your process requirements, throughput and factory integration requirements. Alternatively, click on the photo links to read more about each platform. 

 

LED and Micro Display

Here is a taste of what Evatec can deliver 

Current Spreading, Reflectors and Metal Contacts

We deliver proven processes for the deposition of TCOs, dielectrics and metals, tailoring our process packages for maximum light extraction according to each individual customers LED package design. Choose  the BAK Evaporator with Autoload cassette-to-cassette handling for 6 and 8 inch. Alternatively the CLUSTERLINE® cluster platform equipped with batch process module technology offers plasma damage free low temperature sputter processing on GaN. To view the brochure click here. These same technologies also make "on chip" optical layer processing possible too.

AlN on Si or Sapphire

PVD growth of AlN buffer layers on Si or patterned Sapphire (PSS) on CLUSTERLINE® 200 enables subsequent defect free growth of GaN multi quantum wells (MQW) for manufacture of high brightness LEDs (HBLEDs) at reduced cost per lumen.

SiOx / SiN Passivation Layers and High Aspect Ratio

Addressing future needs for passivation of thin structures, Evatec offers PVD and PECVD based processes as well as solutions for high-aspect ratio coverage.

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