We all want electronic devices that do more and cost less to buy and own, and packaging technology is key. Evatec wafer level thin film processes using HEXAGON enable smaller feature sizes, process highly outgassing organic materials with ease and drive down your production costs in mass production. HEXAGON is dedicated to the most effective high volume advanced packaging processes on 200 or 300mm wafer formats.
Wafer transfer by synchronous indexer enables high speed wafer processing. Wafer handling enables full face etch and deposition processes with in chamber wafer sensing for accurate, repeatable positioning time after time in 24/7 production.
In addition to optional atmospheric batch degasser technology integrated with the AFEM, HEXAGON offers up to 5 process ports for installation of additional specific vacuum based processes. Choose from substrate cooling, ICP soft etch modules including "Arctic" and DC or pulsed DC sputter source installation.
Reducing maintenance time is at the heart of HEXAGON’s design philosophy with a reliable transport system, powered source handling for rapid, easy access by a single operator and easy access to all areas / components form maintenance via a tool pedestal
Click on the individual sections in the circle for a quick overview, and then find more information further down the page.
Equipment Front End Module
Front end handling integrating up to three (3) load ports for FOUPs
Integrates with high speed airlock for:
Atmospheric Batch Degasser
The most reproducible, efficient degas technology for high volume manufacturing in FOWLP
The Unique Evatec vacuum indexer is at the very heart of the system
Evatec etch technology delivers high uniformity , repeatable etch processes for high uptime mass production processes
Enjoy Evatec production proven sputter hardware and process know how
Evatec substrate chuck know how is used in combination with Evatec process technology options to optimise performance
Front end handling allows integration of up to three (3) load ports for FOUPs with their own controlled mini environments. Evatec EFEM hardware supports SEMI E84 communication, and integration of aligner, buffer, flipper and ID reader capabilities.
An Atmospheric Batch Degasser can also be connected to the EFEM as the first process step in applications like FOWLP.
A high speed airlock is then the interface for substrate transfer between atmospheric and vacuum environments. Fast pump-down and vent cycles are key for enabling the subsequent high speed substrate transfer around etch and deposition process stations.
Atmospheric pressure degassing under hot dry nitrogen laminar flow ensures precise substrate temperatures, enables efficient volatiles transport and avoids cross-contamination seen with traditional vacuum degas processes. Evatec proprietary ABD technology offers the most reproducible, efficient degas technology for high volume manufacturing in FOWLP.
Parallel carrier transfer by synchronous indexer is the perfect solution for achieving the highest transfer speeds around the tool between dedicated process positions for wafer cooling, etch and PVD. Indexer technology is the basis for achieving the lowest cost of ownership in mass production on HEXAGON, supporting 200 or 300mm formats, and handling thin, heavy or bowed substrates at throughputs of up to 100 wafer per hour according to application and process specs.
Evatec enhanced etch technology including capability for "arctic etch" delivers high uniformity, repeatable etch processes providing pre-cleaning and surface activation. Achieve etch uniformities <2 % and benefit from both "In-situ pasting" to reduce wafer pasting frequency and from long kit lifetime of more than 20,000 wafers for high uptime mass production processes.
70-years of how-how in PVD processes delivers deposition of Cu and Ti stacks at high power using ARQ310 DC or pulsed DC sputter source with uniformity compensation over target life to achieve outstanding uniformity and process repeatability.
Optimised shield design facilitates low particle levels in daily production. Long life targets deliver reduced material costs per wafer whilst high deposition rates and fast wafer transfer processes come together to drive down cost of ownership in daily production.
Evatec substrate chuck know-how is used in combination with Evatec process technology options to optimise management of substrate temperature and film uniformity during deposition across different wafer sizes and materials. Evatec Advanced Packaging process specialist have access to multiple configurable "arctic", water-cooled, and rotating water‑cooled chuck technologies according to your process needs.
Proven process capabilities come as standard when you choose HEXAGON.
To read more about typical application examples and Evatec know-how in Advanced Packaging download the HEXAGON brochure, view Evatec's LAYERS magazine or visit the news section of our web site.
Evatec’s HEXAGON platform combines hardware innovations with optimized process flows to achieve ultra-low contact resistance (<2 mΩ) and high throughput up to 80 wafers per hour—meeting the demands of advanced UBM and RDL technologies for next-generation packaging.
Evatec’s HEXAGON platform brings a new approach to power device manufacturing with ultra-fast wafer transfer, rapid pump-down, and precise temperature control achieving throughputs up to 80 wafers per hour for SiC processes while driving down cost of ownership.
Evatec’s next-generation HEXAGON platform sets new standards in Advanced Packaging with best-in-class Rc, enhanced wafer safety, and throughputs exceeding 100 wafers per hour, combining improved process flexibility, uptime, and CoO for future-proof production.