CLUSTERLINE® 200
Cluster architecture for 200mm
From Etch and PVD to PECVD & PEALD – Single process module flexibility on a single 200mm platform
Wireless
- SAW & BAW technology including High Sc content AlScN for RF Filters
- Optimisation of stress, crystallinity and resistivity in electode processes
Power Devices
- Front and backside processes with over 50 years production process know-how on Si
- Leading the way for new WBG processes including GaN and SiC
MEMS
- New levels of performance for piezoelectrics including PZT and AlScN
- Full process solutions across metals, oxides, TCOs and soft magnetics