Evatec CLUSTERLINE® 200 & PEALD

Are you looking to develop news process flows integrating PEALD with other etch and deposition technologies? … then check out the partnership between CLUSTERLINE® 200 and Evatec PEALD! Already known for its flexibility in etch, PVD and PECVD, CLUSTERLINE® 200 can be equipped with high performance PEALD technology. Conformality, precise thickness control, and repeatability come as standard but with the advantages that a high density microwave plasma can bring including lower process temperatures or processing of damage sensitive substrates.

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